C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS) StdDcs-Withdrawn This Guide supports the approach

This Guide supports the approach by off-line measurement of the contaminants using best available techniques available in the laboratory setting

such as wafer design and production

This Document covers requirements for phosphine used in the semiconductor industry

the sum of the peak height Zp and the valley depth Zv are reported

C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS) StdDcs-Withdrawn This Guide supports the approachThis Document is to provide a standard of mono dispersed gold nanoparticle (GNP) challenge test for liquid filter rated below 30 nm using inductively coupled plasma mass spectroscopy (ICP MS). This Document covers a mono dispersed GNP challenge test method for below 30 nm rated liquid filter. This Document defines a test condition for mono dispersed GNP challenge test. The following areas are to be addressed in this Document: The test condition such